Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
  • Frontiers in Optics 2009/Laser Science XXV/Fall 2009 OSA Optics & Photonics Technical Digest
  • OSA Technical Digest (CD) (Optica Publishing Group, 2009),
  • paper FThE5
  • https://doi.org/10.1364/FIO.2009.FThE5

Nanoimprinted Polysiloxane optical devices

Not Accessible

Your library or personal account may give you access

Abstract

We demonstrate the fabrication of small core high index contrast Polysiloxane waveguides using Ultraviolet Nanoimprint Lithography for the first time, and report zero process induced excess loss at 1550nm in the finished devices. This technique was also explored for the single step fabrication of more complex devices, e.g., grating waveguide and 3dB couplers.

© 2009 Optical Society of America

PDF Article
More Like This
Nanoimprinting for optical device fabrication: some polymer issues

C.M. Sotomayor Torres, T. Hoffmann, T.P. Sidiki, L. Bruchhaus, J.-U. Bruch, J. Ahopelto, H. Schulz, H.-C. Scheer, Ch. Cardinaud, and K. Pfeiffer
CTuH3 Conference on Lasers and Electro-Optics (CLEO:S&I) 2000

Nanoimprint Lithography of Topology Optimized Photonic Crystal Devices

Brian Bilenberg, Lars Hagedorn Frandsen, Theodor Nielsen, Marko Vogler, Peter Ingo Borel, and Anders Kristensen
CTuK2 Conference on Lasers and Electro-Optics (CLEO:S&I) 2006

Soft UV-Nanoimprint lithography for the Fabrication of Frequency Selective Components

J. Viheriälä, J. Tommila, A. Laakso, S. Ranta, I. Vartiainen, H. Tuovinen, J. Telkkälä, T. Vallius, T. Niemi, M. Dumitrescu, and M. Pessa
CE7_4 The European Conference on Lasers and Electro-Optics (CLEO/Europe) 2009

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved