Quenching Processes in Fluorescence Nanoscopy

E. Rittweger; B. R. Rankin; S. E. Irvine; V. Westphal; S. W. Hell

doi:10.1364/FIO.2008.FTuY5

Frontiers in Optics 2008/Laser Science XXIV/Plasmonics and Metamaterials/Optical Fabrication and Testing
OSA Technical Digest (CD) (Optica Publishing Group, 2008),
paper FTuY5
•https://doi.org/10.1364/FIO.2008.FTuY5

Quenching Processes in Fluorescence Nanoscopy

E. Rittweger, B. R. Rankin, S. E. Irvine, V. Westphal, and S. W. Hell

Frontiers in Optics 2008

Rochester, New York United States
19–23 October 2008
ISBN: 978-1-55752-861-2

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Microscopy Superresolution and Source Engineering II (FTuY)

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E. Rittweger, B. R. Rankin, S. E. Irvine, V. Westphal, and S. W. Hell, "Quenching Processes in Fluorescence Nanoscopy," in Frontiers in Optics 2008/Laser Science XXIV/Plasmonics and Metamaterials/Optical Fabrication and Testing, OSA Technical Digest (CD) (Optica Publishing Group, 2008), paper FTuY5.

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Abstract

We prove that stimulated emission is the dominant depletion mechanism for super resolution microscopy induced by red-shifted illumination for fluorescent dyes in contrast to Mn-doped ZnSe quantum dots which exhibit depletion by excited state absorption.

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