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  • Frontiers in Optics 2007/Laser Science XXIII/Organic Materials and Devices for Displays and Energy Conversion
  • OSA Technical Digest (CD) (Optica Publishing Group, 2007),
  • paper FThV6
  • https://doi.org/10.1364/FIO.2007.FThV6

Rigorous Diffraction and Imaging by Multilayer Phase Structures in Extreme UV Lithography

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Abstract

A rigorous model of projection system for extreme UV lithography will be presented to image multilayer phase structures. These structures have the potential of achieving better image resolution than the commonly used absorbing structures.

© 2007 Optical Society of America

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