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  • Frontiers in Optics 2007/Laser Science XXIII/Organic Materials and Devices for Displays and Energy Conversion
  • OSA Technical Digest (CD) (Optica Publishing Group, 2007),
  • paper FME5
  • https://doi.org/10.1364/FIO.2007.FME5

Implementation of a Programmable Field and Custom Coherence Illuminator for Extreme Ultraviolet Microlithography

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Abstract

Here we summarize recent upgrades to the existing Fourier-synthesis custom coherence Sematech Berkeley Micro Exposure Tool illuminator [1] that provide increased illumination field uniformity and enable dual-domain control of illumination field size and spatial coherence.

© 2007 Optical Society of America

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