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Refractometry in the Ultraviolet with the NIST FT700 UV Fourier Transform Spectrometer

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Abstract

For the past two years our group at NIST has been carrying out measurements of absolute refractive indices of optical materials that will be used in future generations of semiconductor photo lithography at 193nm and 157nm, the emission wavelengths of ArF and F2 excimer lasers.

© 1999 Optical Society of America

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