Abstract
A high power EUV-FEL light source based on an Energy Recovery Linac (ERL) is one of the most promising light sources for future lithography, so that some feasibility studies from the view point of accelerator technology have been done. According to the comments from semiconductor industry, it is also important to reduce the size of the accelerator systems to be installed in a usual LSI Fab. Several feasibility studies and challenges on accelerator elements and system are presented.
© 2018 The Author(s)
PDF ArticleMore Like This
Ryukou Kato, Hiroshi Sakai, Kimichika Tsuchiya, Yasunori Tanimoto, Yosuke Honda, Tsukasa Miyajima, Miho Shimada, Norio Nakamura, and Hiroshi Kawata
ETh2A.2 Compact EUV & X-ray Light Sources (EUVXRAY) 2020
A. Endo, M. Smrz, O. Novak, H. Turcicova, J. Muzik, J. Huynh, T. Mocek, K. Sakaue, and M. Washio
ES4A.2 Compact EUV & X-ray Light Sources (EUVXRAY) 2016
Tetsuya Ishikawa
ES2A.1 Compact EUV & X-ray Light Sources (EUVXRAY) 2016