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Optica Publishing Group
  • CLEO/Europe and EQEC 2009 Conference Digest
  • (Optica Publishing Group, 2009),
  • paper EF_P15

Characterization of Nonlinear Absorption in Femtosecond Laser Inscription

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Abstract

Permanent micro-modification of refractive index in dielectrics by means of femtosecond laser pulses is a novel enabling technology in photonics. A wide range of photonic structures manufactured using this method has been recently demonstrated [1-2], Nonlinear absorption is a crucial mechanism of efficient energy deposition at the spatial scale down to a fraction of laser wavelength. Two main distinct nonlinear absorption processes are relevant in femtosecond energy deposition and inscription process: Multi-Photon Absorption (MPA) and Plasma Absorption (PA) due to resistive dissipation in generated electron-hole plasma. Understanding of the relative contribution of these mechanisms is ultimately required for optimization of the inscription procedures. In this contribution we present detailed experimental characterization of nonlinear absorption and fit numerically the model parameters.

© 2009 IEEE

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