Abstract

We present an inexpensive novel rapid prototyping approach to a maskless and fully adaptive photolithographic process. Phase-only computer-generated holograms of lithographic masks displayed on a liquid-crystal-on-silicon spatial light modulator were used in a holographic optical lithography system. Using holographic projection allows diffraction-limited performance within the given parameters of the optical system, adaptive software refocusing, and a continuous, pixel-free pattern. With the demonstrator, we have successfully proven the concept for micrometer-size lithographic features.

© 2014 Optical Society of America

PDF Article
More Like This
Maskless photolithography using a photon sieve on an optical fiber tip

Raquel Flores, Ricardo Janeiro, Dionísio Pereira, and Jaime Viegas
FTu2I.5 Frontiers in Optics (FiO) 2016

Spatial Light Modulator-Based Maskless Holographic Lithography on Nonplanar Surfaces

David Fischer and Stefan Sinzinger
HTh3H.6 Digital Holography and Three-Dimensional Imaging (DH) 2020

Speckle Suppression in Holographic Projection Displays by Temporal Integration of Diffractive Optical Elements

Wei-Feng Hsu and Chuan-Feng Yeh
DTuC4 Digital Holography and Three-Dimensional Imaging (DH) 2011

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription