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Conferences > COSI > 2017 > CW1B > CW1B.4

Levet-set-based inverse lithography under random field shape uncertainty in a vector Hopkins imaging model

Xiaofei Wu, Tim Fühner, Andreas Erdmann, and Edmund Y. Lam

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Abstract

This paper describes an approach to incorporate a random field uncertainty in level-set-based inverse lithography in a vector imaging model. It is expected that the approach can improve the robustness of the photomask evaluated by MEEF.

© 2017 Optical Society of America

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