Abstract

We deposit a crack-free 780nm-thick Si3N4 film on a dense stress release pattern on a 100mm silicon wafer. Our fabricated waveguide-coupled 920µm-radius Si3N4 disk resonator reveals a high loaded quality factor of 1.7×106.

© 2019 The Author(s)

PDF Article

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription