Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > CLEO_SI > 2018 > STu4O > STu4O.2

Efficient and Wavelength Tunable Extreme-ultraviolet Light Source Used for Tr-ARPES

Zhiqiang Ni, Zhonghui Nie, Jian Tu, Yao Li, Xuezhong Ruan, Liang He, Edmond. Turcu, and Yongbing Xu

Not Accessible

Your library or personal account may give you access

Abstract

Efficient and wavelength tunable extreme-ultraviolet source is developed through high harmonic generation by a frequency doubled Ti:sapphire and a monochromator with an off-plane mount single grating. Peak photon flux of 1.2 x 1011 photons/second is achieved at 21.7 eV.

© 2018 The Author(s)

PDF Article
This paper was not presented at the conference
More Like This
Time-resolved ARPES Based on 8-fs High-harmonic Source in the Extreme Ultraviolet Region

Kento Toume, Katsuya Oguri, Hiroki Mashiko, Keiko Kato, Yoshiaki Sekine, Hiroki Hibino, Akira Suda, and Hideki Gotoh
JTu2A.153 CLEO: Applications and Technology (CLEO:A&T) 2018

Extreme Ultraviolet Light Source by High-Harmonic Generation Inside an Ultrafast Thin-Disk Laser

F. Labaye, M. Gaponenko, V. J. Wittwer, A. Diebold, C. Paradis, N. Modsching, L. Merceron, F. Emaury, I. J. Graumann, C. R. Phillips, C. J. Saraceno, C. Kränkel, U. Keller, and T. Südmeyer
NpTh1C.8 Nonlinear Photonics (NP) 2018

High repetition rate extreme ultraviolet source driven by tunable OPCPA

Jan-Heye Buss, Mihail Petev, Torsten Golz, Jan-C. Deinert, Michael Schulz, and Robert Riedel
NTu1A.6 Nonlinear Optics (NLO) 2021

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use