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Conferences > CLEO_SI > 2018 > SM4O > SM4O.5

STED-inspired Laser Lithography Based on Spirothiopyran Chromophores

Patrick Mueller, Larissa Hammer, Rouven Mueller, Eva Blasco, Christopher Barner-Kowollik, and Martin Wegener

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Abstract

We present a photoresist based on the photochromic spirothiopyran moiety capable of creating free-standing 3D structures and offering an inhibition channel, which potentially allows for STED-inspired sub-diffraction laser lithography. Reversible inhibition and linewidth narrowing are demonstrated.

© 2018 The Author(s)

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