Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > CLEO_SI > 2017 > SM3K > SM3K.6

Sidewall Roughness in Si3N4 Waveguides Directly Measured by Atomic Force Microscopy

Samantha P. Roberts, Xingchen Ji, Jaime Cardenas, Alex Bryant, and Michal Lipson

Not Accessible

Your library or personal account may give you access

Abstract

We have developed a robust method to measure side-wall-roughness of sub-micron feature waveguides using atomic-force-microscopy. We measure the side-wall-roughness of silicon-nitride waveguides patterned by DUV photolithography and compare results of two different etch chemistries.

© 2017 Optical Society of America

PDF Article
More Like This
High Quality Factor Si3N4 Ring Resonators Achieved by Surface Roughness Reduction

Xingchen Ji, Felippe A. S. Barbosa, Alex Bryant, Jaime Cardenas, Samantha P. Roberts, and Michal Lipson
SM2R.3 CLEO: Science and Innovations (CLEO:S&I) 2016

High Confinement and Low Loss Si3N4 Waveguides for Miniaturizing Optical Coherence Tomography

Xingchen Ji, Xinwen Yao, Mohammad A. Tadayon, Aseema Mohanty, Christine P. Hendon, and Michal Lipson
SM3C.4 CLEO: Science and Innovations (CLEO:S&I) 2017

Polarization Insensitive Bragg Gratings in Si3N4 Waveguides

Belaid Tabti, Frederic Nabki, and Michaël Ménard
IW2A.5 Integrated Photonics Research, Silicon and Nanophotonics (IPR) 2017

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use