Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Dramatic and previously overlooked interaction between strain and parasitic absorption in germanium with major implications for Si-compatible lasing

Not Accessible

Your library or personal account may give you access

Abstract

Extensive modeling and experiments demonstrate a dramatic reduction in parasitic absorption with strain due to a previously overlooked mechanism. A special resonance at 4-5% uniaxial strain indicates that this is the optimal strain level for a room temperature Ge laser.

© 2016 Optical Society of America

PDF Article
More Like This
Extension of Germanium-on-Insulator Optical Absorption Edge using CMOS-Compatible Silicon Nitride Stressor

Yiding Lin, Danhao Ma, Kwang Hong Lee, Shuyu Bao, Jurgen Michel, and Chuan Seng Tan
s1595 Conference on Lasers and Electro-Optics/Pacific Rim (CLEO/PR) 2017

Calculation of enhanced direct-gap optical gain in uniaxial tensile strained and n+-doped Ge/GeSi quantum well

Jialin Jiang and Junqiang Sun
JTu4A.1 Integrated Photonics Research, Silicon and Nanophotonics (IPR) 2016

Highly-Strained Germanium as a Gain Medium for Silicon-Compatible Lasers

Devanand Sukhdeo, Donguk Nam, Szu-Lin Cheng, Ze Yuan, Arunanshu Roy, Kevin Chih-Yao Huang, Mark Brongersma, Yoshio Nishi, and Krishna Saraswat
CTh3D.6 CLEO: Science and Innovations (CLEO:S&I) 2012

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.