Dispersion engineered high-Q resonators on a chip

Ki Youl Yang; Katja Beha; Dan Cole; Xu Yi; Pascal Del’Haye; Hansuek Lee; Jiang Li; Dong Yoon Oh; Scott A. Diddams; Scott B. Papp; Kerry J. Vahala

doi:10.1364/CLEO_SI.2016.STu4Q.5

Conference on Lasers and Electro-Optics
OSA Technical Digest (2016) (Optica Publishing Group, 2016),
paper STu4Q.5
•https://doi.org/10.1364/CLEO_SI.2016.STu4Q.5

Dispersion engineered high-Q resonators on a chip

Ki Youl Yang, Katja Beha, Dan Cole, Xu Yi, Pascal Del’Haye, Hansuek Lee, Jiang Li, Dong Yoon Oh, Scott A. Diddams, Scott B. Papp, and Kerry J. Vahala

CLEO: Science and Innovations 2016

San Jose, California United States
5–10 June 2016
ISBN: 978-1-943580-11-8

From the session
Microresonator Combs II (STu4Q)

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K. Y. Yang, K. Beha, D. Cole, X. Yi, P. Del’Haye, H. Lee, J. Li, D. Y. Oh, S. A. Diddams, S. B. Papp, and K. J. Vahala, "Dispersion engineered high-Q resonators on a chip," in Conference on Lasers and Electro-Optics, OSA Technical Digest (2016) (Optica Publishing Group, 2016), paper STu4Q.5.

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Abstract

We demonstrate dispersion control in optical resonators over an octave of optical bandwidth. Dispersion is engineered lithographically and Q factor is maintained above 100 million, which is critical for efficient nonlinear devices such as microcombs.

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