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Characterization of surface-state absorption in foundry-fabricated silicon ridge waveguides at 1550 nm using photocurrents

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Abstract

We study surface-state absorption (SSA) in foundry-fabricated silicon ridge waveguides at 1550 nm using photocurrents. We utilize two-photon-absorption as a self-benchmarking for extracting the SSA coefficient. Our measurements show an SSA coefficient of ~0.32/mm.

© 2016 Optical Society of America

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