Enhanced Coupling in Si3N4 Slot-Mode Optomechanical Crystals via Stress Tuning

Karen E. Grutter; Marcelo Davanço; Kartik Srinivasan

doi:10.1364/CLEO_SI.2015.STh3I.4

CLEO: 2015
OSA Technical Digest (online) (Optica Publishing Group, 2015),
paper STh3I.4
•https://doi.org/10.1364/CLEO_SI.2015.STh3I.4

Enhanced Coupling in Si₃N₄ Slot-Mode Optomechanical Crystals via Stress Tuning

Karen E. Grutter, Marcelo Davanço, and Kartik Srinivasan

CLEO: Science and Innovations 2015

San Jose, California United States
10–15 May 2015
ISBN: 978-1-55752-968-8

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Optomechanics I (STh3I)

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K. E. Grutter, M. Davanço, and K. Srinivasan, "Enhanced Coupling in Si3N4 Slot-Mode Optomechanical Crystals via Stress Tuning," in CLEO: 2015, OSA Technical Digest (online) (Optica Publishing Group, 2015), paper STh3I.4.

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Abstract

We demonstrate Si₃N₄ slot-mode optomechanical crystals with optical Qs up to 1.65 × 10⁵ and mechanical frequencies around 3.4 GHz. Tensile stress tunes gap widths down to 24 nm, enhancing coupling and enabling radiation-pressure-driven self-oscillation.

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