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Conferences > CLEO_SI > 2015 > STh1G > STh1G.6

Extremely Low-Loss Chalcogenide Photonics Devices with Chlorine-Based Plasma Etching

Jeff Chiles, Marcin Malinowski, Ashutosh Rao, Spencer Novak, Kathleen Richardson, and Sasan Fathpour

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Abstract

Chlorine-based plasma is employed to produce extremely low propagation loss as low as 0.42 dB/cm in chalcogenide waveguides, record-high intrinsic Q-factors of 450,000 microring resonators and fiber-to-waveguide grating couplers with a coupling efficiency of 37%.

© 2015 Optical Society of America

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