Abstract
We demonstrate the possibility of forming ultra-compact, field-configurable, and low-power resonance-based passive integrated photonic structures based on charge accumulation in a high-quality multilayer material platform comprising Si/SiO2/Si layers prepared through direct bonding of SOI wafers.
© 2014 Optical Society of America
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Presentation Video
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Highly uniform and low-loss passive silicon photonics devices using a 300mm CMOS platform
Shankar Kumar Selvaraja, Peter De Heyn, Gustaf Winroth, Patrick Ong, Guy Lepage, Celine Cailler, Arnaud Rigny, Konstantin K. Bourdelle, Wim Bogaerts, Dries Van Thourhout, Joris Van Campenhout, and Philippe Absil
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