Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Laser-based plasma sources at 6.6 and 60 nm

Not Accessible

Your library or personal account may give you access

Abstract

Potential high power laser-based xenon and terbium plasma sources are identified based on the reflectivity profiles of the available LaN/B4C, LaN/B, and Al/Yb/Sio multilayer mirrors for applications such as surface processing and semiconductor industry.

© 2013 Optical Society of America

PDF Article
More Like This
Experimental and Numerical Investigation of Laser-based Short Wavelength Plasma Sources

H. Parchamy, J. Szilagyi, M. Masnavi, and M. Richardson
26D3_5 Conference on Lasers and Electro-Optics/Pacific Rim (CLEO/PR) 2015

Laser-Produced Plasma EUV Sources

Harry Shields, Richard H. Moyer, Fernando Martos, Stuart McNaught, Randall Pierre, Steven W. Fornaca, and Mark Michaelian
TuD2 Frontiers in Optics (FiO) 2003

Laser-Plasma Acceleration and Radiation Sources for Applications

L. A. Gizzi, M. P. Anania, M. Ciofini, L. Esposito, P. Ferrara, G. Gatti, D. Giulietti, G. Grittani, J. Hostaša, M. Kando, M. Krus, L. Labate, A. Lapucci, T. Levato, Y. Oishi, A. Pirri, F. Rossi, G. Toci, and M. Vannini
TuD3_1 Conference on Lasers and Electro-Optics/Pacific Rim (CLEO/PR) 2013

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved