Abstract

A one-step introduction of functional defects into a photonic crystal (PC) is demonstrated. By using a multi-beam phase-controlled holographic lithography and a diffracting optical element, large area one dimensional (1D) and two dimensional (2D) PCs with periodic defects was fabricated. The uniform area is up to 4 mm2. Three dimensional photonic crystal with intrinsic defect can also be fabricated by this technique.

© 2012 Optical Society of America

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