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Conferences > CLEO_SI > 2012 > CF1C > CF1C.3

Thin film characterization using third harmonic generation microscopy

C. Rodríguez, R. Weber, D. N. Nguyen, L. A. Emmert, D. Patel, C. S. Menoni, and W. Rudolph

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Abstract

Third harmonic microscopy is applied to determine nonlinear susceptibilities of thin films and image nascent, laser incubated, and laser damaged dielectric coatings with unprecedented contrast. The relative contribution of signals from the film and its surroundings is analyzed.

© 2012 Optical Society of America

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