Near-Field Radiative Heat Transfer between Integrated Nanostructures using Silicon Carbide

Raphael St-Gelais; Linxiao Zhu; Biswajeet Guha; Shanhui Fan; Michal Lipson

doi:10.1364/CLEO_QELS.2015.FTh4E.1

CLEO: 2015
OSA Technical Digest (online) (Optica Publishing Group, 2015),
paper FTh4E.1
•https://doi.org/10.1364/CLEO_QELS.2015.FTh4E.1

Near-Field Radiative Heat Transfer between Integrated Nanostructures using Silicon Carbide

Raphael St-Gelais, Linxiao Zhu, Biswajeet Guha, Shanhui Fan, and Michal Lipson

CLEO: QELS_Fundamental Science 2015

San Jose, California United States
10–15 May 2015
ISBN: 978-1-55752-968-8

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Nanophotonics for Thermal Transfer and Waveguiding (FTh4E)

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R. St-Gelais, L. Zhu, B. Guha, S. Fan, and M. Lipson, "Near-Field Radiative Heat Transfer between Integrated Nanostructures using Silicon Carbide," in CLEO: 2015, OSA Technical Digest (online) (Optica Publishing Group, 2015), paper FTh4E.1.

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Abstract

We present the first experimental demonstration near-field radiative heat transfer using silicon carbide. We achieve a 110× near-field enhancement, relative to the far-field limit, of the radiative heat transfer between integrated nanostructures.

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