Abstract

Applications for ultrashort pulse (<100ps) laser systems are developing at an increasing rate. Broadly, the applications can be categorized as (a) low pulse repetition frequency (PRF) <1MHz, athermal machining with moderate pulse energies, and (b) high PRF, >1MHz highly localized (and controlled) melting with lower pulse energies. Ideally, a single technology platform should address the entire range of applications whilst providing the necessary average power to achieve productivity targets.

© 2019 IEEE

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