Abstract

Direct laser writing in photosensitive materials is an emerging technique, allowing fabrication of arbitrary shape high-resolution 3D microstructures. Commonly, the femtosecond laser sources are used for initiating the photopolymerization reactions. Due to limited availability, only certain wavelengths are used for this technology, particularly ~515, ~800, and ~1030 nm. Although the achievable results among the different groups tend to demonstrate similar quality, there is a lack of knowledge of how the laser wavelength influences the direct laser writing process and resulting structures. In this work we measured photopolymerization and photodamage threshold dependence on the wavelength in 700–1150 nm range by using optical parametrical oscillator (OPO).

© 2017 IEEE