Engineered manipulation of photon flux in structured semiconductor materials with an aperiodic distribution of nanostructures plays a key role in efficiency-enhanced and industrially viable broadband photonic and plasmonic integrated technologies [1, 2]. The dense Fourier spectra of such aperiodic lattice-embedded nanostructured materials could strongly modulate and enable flexible tailoring of the light-matter interaction for broad band nanophotonic applications in comparison to unstructured bulk materials. Through a deterministic bottom-up technological route, we show a versatile generic strategy for very large area nanoengineered c-Si thin films embedded with desired aperiodic nanostructures precisely tailorable for varying integrated applications such as spectrally tunable biosensors, exotic white LEDs, slow light integrated chips, structured thin film photovoltaics, novel surface-enhanced Raman scattering nanoplasmonic building blocks, tailorable photonic bandgap materials and efficient nanophotonic test beds for nonlinear light-matter interactions like Anderson localization.
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