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Using a combination of laser induced fluorescence (LIF) and absorption spectroscopy we are able to directly link, for the first time, the oxidation of plasma species in a SrTiO3 (STO) plasma for pulsed laser deposition (PLD) to the stoichiometry and quality of the thin films grown. With spatiotemporal LIF mapping of the plasma species in different background gas compositions, we find that Ti and Sr have to be fully oxidized for a stoichiometric growth of crystalline thin films, which gives new input for modeling surface growth.
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