Abstract
To boost the fusion between silicon photonics and photonic crystal (PhC) nanocavity technologies, we must fabricate a PhC nanocavity that satisfies the following two criteria; i) it must be fabricated using a CMOS compatible photolithographic fabrication process (instead of electron-beam lithography) and it must be high-Q. ii) It must be fabricated on a silicon-on-insulator structure to ensure robustness.
© 2015 IEEE
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