Abstract

There are several examples of angled multimode intereferometers (AMMI) [1, 2], arrayed waveguide gratings (AWGs) [3] and echelle gratings/planar concave gratings (PCGs) [4] in SOI, as these are the most widely used components for performing wavelength division multiplexing [5]. While the last two usually require an extra lithography step to improve insertion loss and crosstalk as well as a very fine control of the fabrication procedure to improve the spectral response, the AMMI requires a single lithography and etching step and it is more tolerant to fabrication errors. In this paper we demonstrate the first AMMI fabricated in the germanium-on-silicon material platform.

© 2015 IEEE