Abstract

Advanced extreme ultraviolet (EUV) sources currently under development for high volume lithographic nanofabrication are capable to generate powerful radiation in the 13.5 nm-band (within ± 2% bandwidth) [1], but they also emit a significant amount of out-of-band radiation, which needs filtering methods for reliable spectral monitoring. Unfortunately in the EUV, except for sophisticated spectrometers, there are no narrowband transmission filters or simple absorptive filters providing narrow bandwidths with an adjustable transmitted wavelength.

© 2015 IEEE