Abstract

Current fabrication of low-dimension functional materials (semiconductors or metallic nanowires and nanotubes) requires either resource-intensive top-down processing or hardly scalable bottom-up synthesis, which so far have hindered industrial applications and wide accessibility to such materials. Recently iterative fiber drawing techniques have been proposed as a method to fabricate arrays of nanowires [1-3]. This requires multiple fiber draws to be able to realise nanoscale features. Furthermore, this method does not allow the realisation of complex multilayer structures which are not necessarily nanowires or nanotubes and inherent constraints in the traditional fiber drawing process, mainly starting from bulk materials, means that one can only utilise low melting point metals and mostly polymer clads.

© 2015 IEEE