Abstract

A wafer-to-wafer inspection of microsystems is a promising approach for a parallel and thus high speed characterization in particular for MEMS and MOEMS. The probing wafers aligned above the M(O)EMS wafer consists of arrays of micro-optical interferometers for the shape-, deformation-, resonance-characterization. In this contribution we show that binary nano-optical gratings in the resonance domain are ideal elements to build up such integrated interferometers. By means of symmetry considerations the grating’s requirements for an ideal operation of the interferometer are determined. Utilizing the resonance behaviour of such nano-structures an interferometer operation close to the theoretical limits is reachable. A modal analysis reveals the basic effects causing the special responses of the gratings. The gratings are fabricated by electron-beam lithography and accompanied technology.

© 2011 Optical Society of America