Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
  • CLEO/Europe and EQEC 2011 Conference Digest
  • OSA Technical Digest (CD) (Optica Publishing Group, 2011),
  • paper CE1_2

Characterization of InGaAs and InGaAsN saturable absorber mirrors for high power mode locked sub-ps thin-disk lasers

Not Accessible

Your library or personal account may give you access

Abstract

We report on the characteristic parameters of two types of saturable absorber mirrors: type 1 absorbers contain InGaAs quantum wells whereas absorbers of type 2 have InGaAsN quantum wells. For both types the structure is similar. Both types of absorbers were post-growth annealed in order to characterize the stability under elevated temperatures. We investigated the static and the dynamic reflectivity of the two absorber types in the cases of no post-growth annealing and annealing at 450° C, 650° C, and 700° C, respectively. The absorbers are designed for usage in a sub-ps mode locked Yb:YAG laser at a wavelength of 1030 nm [1].

© 2011 Optical Society of America

PDF Article
More Like This
The Impact of Thermal Management of Saturable Absorber on the Performance of Mode-Locked Semiconductor Disk Lasers

A. Rantamäki, J. Lyytikäinen, J. Nikkinen, and O.G. Okhotnikov
CB_P31 The European Conference on Lasers and Electro-Optics (CLEO/Europe) 2011

High-powered saturable absorber mode-locked erbium fiber laser

B. C. Barnett, M. N. Islam, Y. C. Chen, P. Bhattacharya, W. Riha, K. V. Reddy, A. T. Howe, K. A. Stair, H. Iwamura, S. R. Friberg, and T. Mukai
CTuB6 Conference on Lasers and Electro-Optics (CLEO:S&I) 1994

High-power Passively Mode-locked Nd:GdVO4 Laser Using Single-walled Carbon Nanotubes as Saturable Absorber

Hou-Ren Chen, Young-Gang Wang, Kuei-Huei Lin, and Wen-Feng Hsieh
CA_P8 The European Conference on Lasers and Electro-Optics (CLEO/Europe) 2011

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.