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  • CLEO/Europe and EQEC 2009 Conference Digest
  • (Optica Publishing Group, 2009),
  • paper PDB_9

Molecular Lithography – A Quantum Optical Approach

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Abstract

A new detection method for molecular interferometry reveals the wave particle duality of large molecules in its clearest form and enables us to impress nanolitographic structures on a silicon surface. We discuss the deposition of a quantum interference pattern composed of individual high mass molecules on a silicon substrate.

© 2009 IEEE

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