Abstract
In this paper we report the optimization of an ICP dry etching process for the fabrication of submicron-sized features in a range of InP-based materials. High-resolution, deep (> 3.0 μm) dry etching is desirable for fabrication of Distributed Bragg Reflectors (DBRs) and chirped gratings, especially in ridge waveguide lasers.
© 2009 IEEE
PDF ArticleMore Like This
Rong Fang, Xia Guo, Wen Jing Jiang, Yu Han Guo, Yuan Qin, Guang Di Shen, and Jin Ru Han
ThG1 Asia Communications and Photonics Conference and Exhibition (ACP) 2009
R. Dylewicz, R. Green, M. Sorel, A. C. Bryce, and R. M. De La Rue
CK_P26 The European Conference on Lasers and Electro-Optics (CLEO/Europe) 2009
Kaiyu Cui, Yongzhuo Li, Xue Feng, Fang Liu, Yidong Huang, and Wei Zhang
TuPI_5 Conference on Lasers and Electro-Optics/Pacific Rim (CLEO/PR) 2013