Abstract
Light-induced waveguide structures can be induced in photorefractive crystals via side-illumination of the crystal lateral surface with a properly shaped control wave that defines the structure to be generated. In the case where the charge redistribution is principally due to drift in an externally applied electric field, the dielectric waveguide formation is essentially due to local screening of this field, which leads to a local maximum of the refractive index in the illuminated areas. Until now, there has been a limitation of the lateral illumination method. Since the control light generating the waveguide propagates perpendicularly to the wave to be guided, there is no confinement in the direction of propagation of the control wave. The probe light is therefore confined in a single transverse direction and one gets a one-dimensional (1D) planar-like waveguide [1–2]. However, for a fully three-dimensional optical circuitry the generation of channel-type waveguides buried in the bulk of the material is required.
© 2009 IEEE
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