Abstract
The performance of nanophotonic building blocks such as photonic wires and photonic crystals are rapidly improving, with very low propagation loss and very high cavity Q-factors being reported [1]. In order to facilitate further improvements in performance the ability to quantitatively measure topological imperfections such as sidewall roughness on a sub-nm scale becomes essential [2]. In this paper we use atomic force microscopy (AFM) on tilted samples to obtain the most detailed sidewall roughness measurements yet on nanophotonic structures.
© 2007 IEEE
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