Laser Produced Plasma Light Sources for EUV Lithography

Bruno La Fontaine

doi:10.1364/CLEO_APPS.2010.AFA4

This website uses cookies to deliver some of our products and services as well as for analytics and to provide you a more personalized experience. Click here to learn more. By continuing to use this site, you agree to our use of cookies. We’ve also updated our Privacy Notice. Click here to see what’s new.

Allow All Cookies

Conference on Lasers and Electro-Optics: Applications 2010

San Jose, California United States
16–21 May 2010
ISBN: 978-1-55752-889-6

From the session
Imaging and Lithography (AFA)

Laser Produced Plasma Light Sources for EUV Lithography

Bruno La Fontaine

Conference on Lasers and Electro-Optics 2010
OSA Technical Digest (CD) (Optical Society of America, 2010),
paper AFA4
•https://doi.org/10.1364/CLEO_APPS.2010.AFA4

Get Citation
Copy Citation Text
B. La Fontaine, "Laser Produced Plasma Light Sources for EUV Lithography," in Conference on Lasers and Electro-Optics 2010, OSA Technical Digest (CD) (Optical Society of America, 2010), paper AFA4.

Export Citation
- BibTex
- Endnote (RIS)
- HTML
- Plain Text
Get PDF (114 KB)
Set citation alerts
Save article

Related Topics
Optics & Photonics Topics
?

The topics in this list come from the OSA Optics and Photonics Topics applied to this article.
Previously assigned OCIS codes
- Lasers and laser optics (140.0140)
- Molecular gas lasers (140.4130)

Not Accessible

Your account may give you access

Abstract

We present the latest results on high-power extreme-ultraviolet (EUV) light sources for lithography. This includes operation of high-power pulsed CO<sup>2</sup>lasers, high repetition-rate Sn droplet targets, and collection of EUV light using multilayer-coated optics.

PDF Article

Privacy | Terms of Use

Abstract

Conference on Lasers and Electro-Optics: Applications 2010

Login or Create Account