Modelling Propagation Loss of PECVD Silicon Nitride Strip Waveguides: Evaluation andAssessment of Width Dependency

Anton Buchberger; Anton Buchberger; Jozef Pulko; Deborah Morecroft; Omar Basso; Jochen Kraft; Alexander Bergmann

doi:10.1364/CLEO_AT.2021.JTh3A.84

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 2021),
paper JTh3A.84
•https://doi.org/10.1364/CLEO_AT.2021.JTh3A.84

Modelling Propagation Loss of PECVD Silicon Nitride Strip Waveguides: Evaluation andAssessment of Width Dependency

Anton Buchberger, Jozef Pulko, Deborah Morecroft, Omar Basso, Jochen Kraft, and Alexander Bergmann

CLEO: Applications and Technology 2021

San Jose, California United States
9–14 May 2021
ISBN: 978-1-943580-91-0

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Joint Poster Session III (JTh3A)

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A. Buchberger, J. Pulko, D. Morecroft, O. Basso, J. Kraft, and A. Bergmann, "Modelling Propagation Loss of PECVD Silicon Nitride Strip Waveguides: Evaluation andAssessment of Width Dependency," in Conference on Lasers and Electro-Optics, J. Kang, S. Tomasulo, I. Ilev, D. Müller, N. Litchinitser, S. Polyakov, V. Podolskiy, J. Nunn, C. Dorrer, T. Fortier, Q. Gan, and C. Saraceno, eds., OSA Technical Digest (Optica Publishing Group, 2021), paper JTh3A.84.

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Abstract

Measurements of the width-dependent propagation loss of 250 nm thick silicon nitride strip waveguides at 850 nm wavelength indicate good agreement with the theoretical model. The waveguides were fabricated by plasma-enhanced chemical vapor deposition (PECVD).

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