Regulating the Fs-laser Material Removal Mechanism to Improve Processing Quality Effectively

Zhixuan Li; Jinze Li; Qiang Wu; Xiaoyang Hu; Xinda Jiang; Hao Xiong; Jianghong Yao; Jingjun Xu

doi:10.1364/CLEO_AT.2020.JW2B.18

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 2020),
paper JW2B.18
•https://doi.org/10.1364/CLEO_AT.2020.JW2B.18

Regulating the Fs-laser Material Removal Mechanism to Improve Processing Quality Effectively

Zhixuan Li, Jinze Li, Qiang Wu, Xiaoyang Hu, Xinda Jiang, Hao Xiong, Jianghong Yao, and Jingjun Xu

CLEO: Applications and Technology 2020

Washington, DC United States
10–15 May 2020
ISBN: 978-1-943580-76-7

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Joint Poster Session 8 (JW2B)

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Z. Li, J. Li, Q. Wu, X. Hu, X. Jiang, H. Xiong, J. Yao, and J. Xu, "Regulating the Fs-laser Material Removal Mechanism to Improve Processing Quality Effectively," in Conference on Lasers and Electro-Optics, OSA Technical Digest (Optica Publishing Group, 2020), paper JW2B.18.

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Abstract

A novel method, confirmed theoretically and experimentally, is demonstrated to regulate the material removal mechanism in fs-laser processing via elevating the initial temperature of the sample, which effectively improves the processing quality.

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