State of the Art Optical Materials for Lithographic Systems for Semiconductor Manufacturing

Ralf Takke; Bodo Kuehn; Stephan Thomas

doi:10.1364/CLEO_AT.2014.JTh4J.5

CLEO: 2014
OSA Technical Digest (online) (Optica Publishing Group, 2014),
paper JTh4J.5
•https://doi.org/10.1364/CLEO_AT.2014.JTh4J.5

State of the Art Optical Materials for Lithographic Systems for Semiconductor Manufacturing

Ralf Takke, Bodo Kuehn, and Stephan Thomas

CLEO: Applications and Technology 2014

San Jose, California United States
8–13 June 2014
ISBN: 978-1-55752-999-2

From the session
Symposium on High Performance Optics II (JTh4J)

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R. Takke, B. Kuehn, and S. Thomas, "State of the Art Optical Materials for Lithographic Systems for Semiconductor Manufacturing," in CLEO: 2014, OSA Technical Digest (online) (Optica Publishing Group, 2014), paper JTh4J.5.

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Abstract

193nm lithography has enabled semiconductor manufacturing to achieve nm resolution. Highest quality optical materials and optics are an essential part of this. Important optical properties of and test methods for these materials will be reported.

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