An investigation into UV two-photon etching of diamond surfaces in low pressure conditions is presented. A tenfold increase in etch rate was observed, attributed to the reduced role of water vapour in suppressing carbon ejection.
© 2020 The Author(s)
You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
Login to access OSA Member Subscription