Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > CLEOPR > 2015 > 26F2 > 26F2_4
  • 2015 Conference on Lasers and Electro-Optics Pacific Rim
  • (Optica Publishing Group, 2015),
  • paper 26F2_4

Actinic EUV Mask Inspection using Coherent EUV Source based on High-order Harmonic Generation

Yong Soo Kim, June Park, Han Yong Park, Hamin Sung, Jomsool Kim, Seung Beom Lee, Hyun Woo Cho, Ju Han Lee, Min-Chul Park, and Young Min Jhon

Not Accessible

Your library or personal account may give you access

Abstract

We developed a coherent scattering microscope (CSM) for actinic EUV mask inspection. The CSM system was designed to measure critical dimensions down to 88 nm, and 200 nm l/s patterns were experimentally inspected.

© 2015 IEEE

PDF Article
More Like This
Actinic Mask Inspection System Using HHG EUV Source

Hiroo Kinoshita
EW1B.3 Compact EUV & X-ray Light Sources (EUVXRAY) 2018

A Compact High-Brightness Accelerator-based EUV Source for Actinic Mask Inspection

Yasin Ekinci, Terence Garvey, Leonid Rivkin, Andreas Streun, and Albin Wrulich
ET3B.5 Compact EUV & X-ray Light Sources (EUVXRAY) 2018

Characteristics of the Coherent EUV Light Source for EUV Metrology

Yong Soo Kim, Younghee Kim, June Park, Hamin Sung, Jomsool Kim, Ju Han Lee, and Young Min Jhon
25B2_3 Conference on Lasers and Electro-Optics/Pacific Rim (CLEO/PR) 2015

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use