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  • Conference on Lasers and Electro-Optics/Pacific Rim 2009
  • (Optica Publishing Group, 2009),
  • paper TuJ3_4

Diagnostics of Ablation Dynamics of Tin micro-Droplet for EUV Lithography Light Source

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Abstract

The ablation dynamics of tin micro-droplet target irradiated by double pulses was investigated for extreme ultraviolet lithography source. Debris from Sn droplet target was visualized by the laser-induced fluorescence imaging and shadowgraph imaging.

© 2009 IEEE

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