Single-Mode Emission from Si Nanocrystal Embedded Si-rich SiOx film with Photonic Crystal Resonant Cavity

Yung-Hsiang Lin; Shih-Min Lin; Chien-Chieh Lee; Chii-Chang Chen; Gong-Ru Lin

doi:10.1364/CLEO.2010.CMI3

Conference on Lasers and Electro-Optics 2010
OSA Technical Digest (CD) (Optica Publishing Group, 2010),
paper CMI3
•https://doi.org/10.1364/CLEO.2010.CMI3

Single-Mode Emission from Si Nanocrystal Embedded Si-rich SiOx film with Photonic Crystal Resonant Cavity

Yung-Hsiang Lin, Shih-Min Lin, Chien-Chieh Lee, Chii-Chang Chen, and Gong-Ru Lin

Conference on Lasers and Electro-Optics 2010

San Jose, California United States
16–21 May 2010
ISBN: 978-1-55752-889-6

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Passive and Active Resonators (CMI)

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Y. Lin, S. Lin, C. Lee, C. Chen, and G. Lin, "Single-Mode Emission from Si Nanocrystal Embedded Si-rich SiOx film with Photonic Crystal Resonant Cavity," in Conference on Lasers and Electro-Optics 2010, OSA Technical Digest (CD) (Optica Publishing Group, 2010), paper CMI3.

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Abstract

A photonic crystal resonator incorporated Si-rich SiOx film with buried Si nanocrystals showing room-temperature single-mode emission at 639 nm is demonstrated with spectral linewidth of 1 nm and threshold pumping intensity of 50.3 kW/cm².

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