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Conferences > CLEO > 2009 > JTuD > JTuD40
  • Conference on Lasers and Electro-Optics/International Quantum Electronics Conference
  • OSA Technical Digest (CD) (Optica Publishing Group, 2009),
  • paper JTuD40
  • •https://doi.org/10.1364/CLEO.2009.JTuD40

Nanometer-Scale Machining by Laser Ablation with a Focused Extreme Ultraviolet Laser Beam

H. Bravo, B.T. Szapiro, P.W. Wachulak, M.C. Marconi, W. Chao, E.H. Anderson, D.T. Attwood, C.S. Menoni, and J.J. Rocca

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Abstract

We report the ablation of 200 nm-top wide (130 nm FWHM) trenches on PMMA photoresist by focusing the extreme ultraviolet output from a table-top capillary discharge laser with a Fresnel zone plate lens.

© 2009 Optical Society of America

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