Low-Refractive-Index Materials – A New Class of Optical Thin-Film Materials

E. Fred Schubert; E. Fred Schubert; E. Fred Schubert; Jong Kyu Kim; Jong Kyu Kim; Jong Kyu Kim

doi:10.1364/CLEO.2009.CTuF1

Conference on Lasers and Electro-Optics/International Quantum Electronics Conference
OSA Technical Digest (CD) (Optica Publishing Group, 2009),
paper CTuF1
•https://doi.org/10.1364/CLEO.2009.CTuF1

Low-Refractive-Index Materials – A New Class of Optical Thin-Film Materials

E. Fred Schubert and Jong Kyu Kim

Conference on Lasers and Electro-Optics 2009

Baltimore, Maryland United States
31 May–5 June 2009
ISBN: 978-1-55752-869-8

From the session
LED Materials and III-Nitride Semiconductors (CTuF)

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E. F. Schubert and J. K. Kim, "Low-Refractive-Index Materials – A New Class of Optical Thin-Film Materials," in Conference on Lasers and Electro-Optics/International Quantum Electronics Conference, OSA Technical Digest (CD) (Optica Publishing Group, 2009), paper CTuF1.

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Abstract

The refractive index is the most fundamental quantity in optics. However, no optical thin-film materials have been available in the index range 1.05–1.4. A new class of low-index materials is presented including several applications.

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