Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
  • Conference on Lasers and Electro-Optics/International Quantum Electronics Conference
  • OSA Technical Digest (CD) (Optica Publishing Group, 2009),
  • paper CThG2
  • https://doi.org/10.1364/CLEO.2009.CThG2

Parallel Direct-Write Nanolithography Using Arrays of Optically Trapped Microlenses

Not Accessible

Your library or personal account may give you access

Abstract

We use Bessel beam optical traps to self-position arrays of microsphere objectives near surfaces. Pulsed laser illumination of these objectives is used to perform near-field direct-write subwavelength optical nanopatterning with 100 nm feature sizes.

© 2009 Optical Society of America

PDF Article
More Like This
Laser Direct Write Near-Field Nanopatterning Using Optically Trapped Microspheres

Euan McLeod and Craig B. Arnold
CMX2 Conference on Lasers and Electro-Optics (CLEO:S&I) 2008

Laser Direct-write Nanopatterning by Near-field Multiphoton Polymerization Using Optically Trapped Microspheres

Yu-Cheng Tsai, Karl-Heinz Leitz, Romain Fardel, Michael Schmidt, and Craig B. Arnold
CTU1J.5 CLEO: Science and Innovations (CLEO:S&I) 2012

Speed Investigations toward an Industrial Application of Optical Trap Assisted Nanopatterning

Romain Fardel, Yu-Cheng Tsai, and Craig B. Arnold
AMD2 CLEO: Applications and Technology (CLEO:A&T) 2011

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.