Simultaneous measurement of structure and XUV dielectric constant of nanoscale objects using diffraction of high harmonic radiation

B Mills; C F Chau; E T F Rogers; J Grant-Jacob; S L Stebbings; M Praeger; A M de Paula; C A Froud; R T Chapman; T J Butcher; W S Brocklesby; J G Frey

doi:10.1364/CLEO.2009.CFN6

Conference on Lasers and Electro-Optics/International Quantum Electronics Conference
OSA Technical Digest (CD) (Optica Publishing Group, 2009),
paper CFN6
•https://doi.org/10.1364/CLEO.2009.CFN6

Simultaneous measurement of structure and XUV dielectric constant of nanoscale objects using diffraction of high harmonic radiation

B Mills, C F Chau, E T F Rogers, J Grant-Jacob, S L Stebbings, M Praeger, A M de Paula, C A Froud, R T Chapman, T J Butcher, W S Brocklesby, and J G Frey

Conference on Lasers and Electro-Optics 2009

Baltimore, Maryland United States
31 May–5 June 2009
ISBN: 978-1-55752-869-8

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B. Mills, C. F. Chau, E. T. F. Rogers, J. Grant-Jacob, S. L. Stebbings, M. Praeger, A. M. de Paula, C. A. Froud, R. T. Chapman, T. J. Butcher, W. S. Brocklesby, and J. G. Frey, "Simultaneous measurement of structure and XUV dielectric constant of nanoscale objects using diffraction of high harmonic radiation," in Conference on Lasers and Electro-Optics/International Quantum Electronics Conference, OSA Technical Digest (CD) (Optica Publishing Group, 2009), paper CFN6.

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Abstract

XUV diffraction using radiation generated by high harmonic generation is used simultaneously to determine both the structure and the complex refractive index of a partially ordered array of 196 nm diameter polystyrene spheres.

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