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Conferences > CLEO > 2008 > CMX > CMX3
  • Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies
  • OSA Technical Digest (CD) (Optica Publishing Group, 2008),
  • paper CMX3

Realization of an ultra-flat silica surface with angstrom-scale average roughness using nanophotonic polishing

T. Yatsui, W. Nomura, M. Ohtsu, K. Hirata, and Y. Tabata

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Abstract

We report that nanophotonic polishing of a silica substrate using a nonadiabatic photochemical reaction drastically reduced the average surface roughness, Ra, and the dispersion of Ra

© 2008 Optical Society of America

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